Heteroepitaxial growth of KNbO3 single-crystal films on SrTiO3 by metalorganic chemical vapor deposition

被引：43

作者：

Onoe, A

Yoshida, A

Chikuma, K

机构：

来源：

APPLIED PHYSICS LETTERS | 1996年 / 69卷 / 02期

关键词：

D O I：

10.1063/1.117360

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Potassium niobate (KNbO3) thin films have been deposited on silicon (Si) and strontium titanate (SrTiO3) substrates by metalorganic chemical vapor deposition. Stoichiometric KNbO3 films were obtained by adjusting the partial pressure of precursors. The crystallinity was examined by x-ray diffraction and reflection high-energy electron diffraction. Single-crystal (010) KNbO3 films with smooth surface were heteroepitaxially grown on (110)SrTiO3 substrate at 850 degrees C. (C) 1996 American Institute of Physics.

引用

页码：167 / 169

页数：3

共 8 条

[1] OPTICAL STRIP WAVE-GUIDES IN KNBO3 FORMED BY HE ION-IMPLANTATION [J].