Annealing studies of photoluminescence spectra from multiple Er3+ centers in Er-implanted GaN

被引:11
作者
Kim, S [1 ]
Rhee, SJ
Li, X
Coleman, JJ
Bishop, SG
机构
[1] Univ Illinois, Microelect Lab, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
activation; Er; GaN; implantation; photoluminescence (PL);
D O I
10.1007/s11664-999-0026-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A study of selectively excited photoluminescence (PL) at similar to 6K in Er-implanted GaN as a function of annealing temperature (400-1000 degrees C) has detected nine different Er3+ centers with distinct; similar to 1540 nm I-4(13/2) --> I-4(15/2) Er3+ PL spectra and different activation temperatures. However, most of the optically active implanted Er atoms are incorporated at annealing temperatures as low as 400 degrees C on a single type of center for which PL can only be excited efficiently by direct intra-4f shell absorption and is not strongly pumped by either above-gap or broad-band below-gap absorption. This strongly suggests that this high-concentration Er3+ center is an isolated, isoelectronic center consistent with Er3+ substituted on a Ga site. In contrast, a very small fraction of the Er atoms that form a variety of Er-defect/impurity complexes dominate the Er3+ emission spectra excited by above-gap and broad-band below-gap absorption because of their larger cross sections for both carrier capture and optical absorption.
引用
收藏
页码:266 / 274
页数:9
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