Study of structural imperfections in sputtered Co/Cu multilayers

被引：6

作者：

Kok, KY

Leake, JA

机构：

[1] Dept. of Mat. Science and Metallurgy, University of Cambridge, Cambridge CB2 3QZ, Pembroke Street

来源：

THIN SOLID FILMS | 1996年 / 275卷 / 1-2期

关键词：

structural properties; sputtering; multilayers; magnetic properties and measurements;

D O I：

10.1016/0040-6090(95)07045-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Structural deviations from ideal layering can have a marked effect on the physical properties of multilayers. Using X-ray diffraction and cross-sectional transmission electron microscopy as the structural probes, we have systematically identified the presence of a variety of structural imperfections in sputtered Co/Cu multilayers. By constructing a structural model which realistically represents the multilayer structures, we attempt to extract structural data on the regularity of layering and interfacial roughness through the fitting of low-angle X-ray diffractograms.

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收藏

页码：210 / 212

页数：3

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