Photomechanical Degrafting of Azo-Functionalized Poly(methacrylic acid) (PMAA) Brushes

被引：46

作者：

Schuh, Christian ^{[1
]}

Lomadze, Nino ^{[1
]}

Ruehe, Juergen ^{[1
]}

Kopyshev, Alexey ^{[2
]}

Santer, Svetlana ^{[2
,3
]}

机构：

[1] Univ Freiburg, Dept Microsyst Engn IMTEK, D-79110 Freiburg, Germany

[2] Univ Freiburg, Inst Adv Studies FRIAS, D-79104 Freiburg, Germany

[3] Univ Potsdam, Inst Phys & Astron, D-14476 Potsdam, Germany

来源：

JOURNAL OF PHYSICAL CHEMISTRY B | 2011年 / 115卷 / 35期

关键词：

SURFACE-RELIEF GRATINGS; AZOBENZENE POLYMER-FILMS; PHOTOINDUCED TRANSLATION DIFFUSION; HOLOGRAPHIC DATA-STORAGE; THIN-FILMS; LIQUID-CRYSTAL; AMORPHOUS POLYMERS; SIDE-CHAINS; LIGHT; ALIGNMENT;

D O I：

10.1021/jp2041229

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report on the preparation and characterization of photosensitive polymer brushes. The brushes are synthesized through polymer analogous attachment of azobenzene groups to surface-attached poly(methacrylic acid) (PMAA) chains. The topography of the photosensitive brushes shows a strong reaction upon irradiation with UV light. While homogeneous illumination leaves the polymer topography unchanged, irradiation of the samples with interference patterns with periodically varying light intensity leads to the formation of surface relief gratings (SRG). The height of the stripes of the grating can be controlled by adjusting the irradiation time. The SRG pattern can be erased through solvent treatment when the periodicity of the stripe pattern is less than the length of the fully stretched polymer chains. In the opposite case, photomechanical scission of receding polymer chains is observed during SRG formation, and the inscribed patterns are permanent.

引用

页码：10431 / 10438

页数：8

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