Ultrafast electron dynamics at metal interfaces: Intraband relaxation of image state electrons as friction

被引:9
作者
Garrett-Roe, S
Shipman, ST
Szymanski, P
Strader, ML
Yang, A
Harris, CB [1 ]
机构
[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
[2] EO Lawrence Berkeley Natl Lab, Div Chem Sci, Berkeley, CA 94720 USA
关键词
D O I
10.1021/jp051977z
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Two-photon photoemission of image potential states above monolayers of p-xylene/Ag(l 11) shows that electrons with different momenta have very different rise and decay rates as a function of parallel momentum. The dynamics are due to energy and momentum loss (intraband relaxation), which we model as a stochastic process isomorphic to the overdamped motion of a harmonic oscillator. The method extracts a friction coefficient from the data which can be explained by electron-electron scattering in a formalism based on the Lindhard dielectric function. One-electron excitations (interband transistions) dominate the dissipation mechanism, with a smaller contribution from collective electronic excitations (plasmons).
引用
收藏
页码:20370 / 20378
页数:9
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