Electrodeposition of Cu/Fe20Ni80 magnetic multilayers

被引:28
作者
Chassaing, E
Nallet, P
Trichet, MF
机构
[1] Ctr. d'Etud. Chim. Metallurgique, CNRS
关键词
D O I
10.1149/1.1836664
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Electrodeposition conditions have been studied in order to prepare Cu/Fe20Ni80 multilayers by the pulse potential method using a single electrolyte. Individual layer thicknesses ranged between 0.5 and 3 nm. Up to 40 bilayers were electrodeposited either on copper or glass plate substrates. Grazing angle x-ray diffraction showed good coherency between the layers. A magnetic coupling between FeNi layers has been observed with a magnetoresistance ratio of 2% at 2 kOe and 77 K.
引用
收藏
页码:L98 / L100
页数:3
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