Breakdown of colloid filtration theory: Role of the secondary energy minimum and surface charge heterogeneities

被引:398
作者
Tufenkji, N
Elimelech, M
机构
[1] McGill Univ, Dept Chem Engn, Montreal, PQ H3A 2B2, Canada
[2] Yale Univ, Dept Chem Engn, Environm Engn Program, New Haven, CT 06520 USA
关键词
D O I
10.1021/la048102g
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The mechanisms and causes of deviation from the classical colloid filtration theory (CFT) in the presence of repulsive Derjaguin-Landau-Verwey-Overbeek (DLVO) interactions were investigated. The deposition behavior of uniform polystyrene latex colloids in columns packed with spherical soda-lime glass beads was systematically examined over a broad range of physicochemical conditions, whereby both the fluid-phase effluent particle concentration and the profile of retained particles were measured. Experiments conducted with three different-sized particles in a simple (1:1) electrolyte solution reveal the controlling influence of secondary minimum deposition on the deviation from CFT. In a second series of experiments, sodium dodecyl sulfate (SDS) was added to the background electrolyte solution with the intent of masking near-neutrally charged regions of particle and collector surfaces. These results indicate that the addition of a small amount of anionic surfactant is sufficient to reduce the influence of certain surface charge inhomogeneities on the deviation from CFT. To verify the validity of CFT in the absence of surface charge heterogeneities, a third set of experiments was conducted using solutions of high pH to mask the influence of metal oxide impurities on glass bead surfaces. The results demonstrate that both secondary minimum deposition and surface charge heterogeneities contribute significantly to the deviation from CFT generally observed in colloid deposition studies. It is further shown that agreement with CFT is obtained even in the presence of an energy barrier (i.e., repulsive colloidal interactions), suggesting that it is not the general existence of repulsive conditions which causes deviation but rather the combined occurrence of "fast" and "slow" particle deposition.
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收藏
页码:841 / 852
页数:12
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