Beyond β-C3N4-fullerene-like carbon nitride:: A promising coating material

被引:51
作者
Neidhardt, Jorg [1 ]
Hultman, Lars
机构
[1] Univ Min & Met Leoben, Dept Phys Met & Mat Testing, Christian Doppler Lab Adv Hard Coating, A-8700 Leoben, Austria
[2] Linkoping Univ, IFM, Dept Phys, Thin Film Phys Div, S-58183 Linkoping, Sweden
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2007年 / 25卷 / 04期
关键词
DIAMOND-LIKE CARBON; FULLERENE-LIKE CNX; THIN SOLID FILMS; MECHANICAL-PROPERTIES; 1ST-PRINCIPLES CALCULATIONS; TRIBOLOGICAL PROPERTIES; ELECTRONIC-STRUCTURE; COMPUTER-SIMULATION; DEPOSITION; GROWTH;
D O I
10.1116/1.2738505
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Even though the synthesis of super-hard-crystalline beta-C3N4 remains elusive, noncrystalline CNx compounds are of increasing importance owing to their competitive properties. Especially the fullerene-like allotrope of CNx exhibits outstanding elasticity in combination with low work of indentation. This new class of thin solid film materials is characterized by a microstructure of bent and intersecting basal planes. Substitutional incorporation of nitrogen into the predominantly sp(2) hybridized graphitic layer triggers the formation of curvature-inducing pentagons and interplanar cross-links at a much lower energy cost as compared to carbon-only materials. The term "fullerene-like" was coined to reflect the nanometer scale of curved structural units. Thus, fullerene-like CNx deforms by bond angle deflection and compression of the graphitic interplanar lattice spacing, whereas the superior strength of the sp(2) bonds inhibits plastic deformation giving the material an extremely resilient character. The orientation, radius of curvature of basal planes, and density of cross-linking can be adjusted by the synthesis conditions. Here, the existence of significant numbers of precursor molecules is a determining factor. The inherent resiliency of the material in combination with the carbon-based beneficial friction promises to give rise to numerous tribological applications. (c) 2007American Vacuum Society.
引用
收藏
页码:633 / 644
页数:12
相关论文
共 98 条
[1]   Nitrogen incorporation in carbon nitride films produced by direct and dual ion-beam sputtering -: art. no. 074907 [J].
Abrasonis, G ;
Gago, R ;
Jimenez, I ;
Kreissig, U ;
Kolitsch, A ;
Möller, W .
JOURNAL OF APPLIED PHYSICS, 2005, 98 (07)
[2]   Sixfold ring clustering in sp2-dominated carbon and carbon nitride thin films:: A Raman spectroscopy study [J].
Abrasonis, G ;
Gago, R ;
Vinnichenko, M ;
Kreissig, U ;
Kolitsch, A ;
Möller, W .
PHYSICAL REVIEW B, 2006, 73 (12)
[3]   Carbon films with an sp2 network structure [J].
Alexandrou, I ;
Scheibe, HJ ;
Kiely, CJ ;
Papworth, AJ ;
Amaratunga, GAJ ;
Schultrich, B .
PHYSICAL REVIEW B, 1999, 60 (15) :10903-10907
[4]  
[Anonymous], THESIS LINKOPING U
[5]   A new fullerene-like inorganic compound fabricated by the sonolysis of an aqueous solution of TlCl3 [J].
Avivi, S ;
Mastai, Y ;
Gedanken, A .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2000, 122 (18) :4331-4334
[6]   Silicon carbonitride: a rival to cubic boron nitride [J].
Badzian, A ;
Badzian, T ;
Drawl, WD ;
Roy, R .
DIAMOND AND RELATED MATERIALS, 1998, 7 (10) :1519-1525
[7]   Some tribology and mechanics issues for 100-Gb/in2 hard disk drive [J].
Bogy, DB ;
Fong, W ;
Thornton, BH ;
Zhu, H ;
Gross, HM ;
Bhatia, CS .
IEEE TRANSACTIONS ON MAGNETICS, 2002, 38 (05) :1879-1885
[8]   FORMATION OF C-N THIN-FILMS BY ION-BEAM DEPOSITION [J].
BOYD, KJ ;
MARTON, D ;
TODOROV, SS ;
ALBAYATI, AH ;
KULIK, J ;
ZUHR, RA ;
RABALAIS, JW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (04) :2110-2122
[9]   Electrical properties of carbon nitride thin films: Role of morphology and hydrogen content [J].
Broitman, E ;
Hellgren, N ;
Neidhardt, J ;
Brunell, I ;
Hultman, L .
JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (09) :L11-L15
[10]   Mechanical and tribological properties of CNx films deposited by reactive magnetron sputtering [J].
Broitman, E ;
Hellgren, N ;
Wänstrand, O ;
Johansson, MP ;
Berlind, T ;
Sjöström, H ;
Sundgren, JE ;
Larsson, M ;
Hultman, L .
WEAR, 2001, 248 (1-2) :55-64