Observations of low cycle fatigue of Al thin films for MEMS applications

被引:20
作者
Cornella, G [1 ]
Vinci, RP [1 ]
Iyer, RS [1 ]
Dauskardt, RH [1 ]
Bravman, JC [1 ]
机构
[1] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
来源
MICROELECTROMECHANICAL STRUCTURES FOR MATERIALS RESEARCH | 1998年 / 518卷
关键词
D O I
10.1557/PROC-518-81
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper addresses tension-tension (R=0) low cycle fatigue behavior of thin film Al structures released from a substrate. Al beam specimens 2 mu m thick, 50 mu m wide and 500 mu m long (gauge length) were micromachined over a window in a Si substrate. Cyclic load-displacement behavior was investigated using a multiple step test method, in which each specimen was cycled with several blocks of constant maximum displacement amplitude. Load, displacement and temperature were recorded continuously. A load drop and a corresponding stabilized state were observed for each displacement block. Monotonic tension tests to failure were also performed for comparison. Evidence of cyclic creep was observed. SEM images revealed fatigue markings on cyclically loaded specimens but not on monotonically loaded beams.
引用
收藏
页码:81 / 86
页数:4
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