Microstructure and mechanical properties of sputter-deposited Ti-Ni alloy thin films

被引：36

作者：

Ishida, A

Miyazaki, S

机构：

[1] Natl Res Inst Met, Tsukuba, Ibaraki 3050047, Japan

[2] Univ Tsukuba, Inst Mat Sci, Tsukuba, Ibaraki 3058573, Japan

来源：

JOURNAL OF ENGINEERING MATERIALS AND TECHNOLOGY-TRANSACTIONS OF THE ASME | 1999年 / 121卷 / 01期

关键词：

D O I：

10.1115/1.2815996

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The shape memory effect, superelasticity and two-way shape memory effect of Ni-rich Ti-Ni sputter-deposited thin films were evaluated quantitatively. The results indicated that they are almost cmoparable to those of bulk specimens. On the hand, Ti-rich Ti-Ni thin films were found to exhibit a good shape memory behavior owing to a peculiar fine microstructure unlike bulk specimens. Addition of Cu or Pd to a Ti-50at.%Ni thin films was also confirmed to improve the shape memory behavior. These results suggest that shape memory thin films are a promising material for microactuators.

引用

页码：2 / 8

页数：7

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