Structure and composition of sputter-deposited nickel-tungsten oxide films

被引：63

作者：

Green, S. V. ^{[1
]}

Kuzmin, A. ^{[2
]}

Purans, J. ^{[2
]}

Granqvist, C. G. ^{[1
]}

Niklasson, G. A. ^{[1
]}

机构：

[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, SE-75121 Uppsala, Sweden

[2] Univ Latvia, Inst Solid State Phys, Riga, Latvia

来源：

THIN SOLID FILMS | 2011年 / 519卷 / 07期

关键词：

Tungsten oxide; Nickel oxide; X-ray photoelectron spectroscopy; Rutherford backscattering; X-ray diffraction; Raman spectroscopy; RAY PHOTOELECTRON-SPECTROSCOPY; ELECTROCHROMIC THIN-FILMS; ELECTRONIC-STRUCTURE; RAMAN; XPS; NIO; PHOTOEMISSION; ABSORPTION; MECHANISM; SPECTRA;

D O I：

10.1016/j.tsf.2010.10.033

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Films of mixed nickel-tungsten oxide, denoted Ni(x)W(1-x) oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry. X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x<0.50 the films comprised a mixture of amorphous WO(3) and nanosized NiWO(4), at x = 0.50 the nanosized NiWO(4) phase was dominating, and at x>0.50 the films contained nanosized NiO and NiWO(4). (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2062 / 2066

页数：5

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