Imprinting well-controlled nanopores in organosilicate dielectric films:: Triethoxysilyl-modified six-armed poly(ε-caprolactone) and its chemical hybridization with an organosilicate precursor

被引:97
作者
Lee, B
Oh, W
Hwang, Y
Park, YH
Yoon, J
Jin, KS
Heo, K
Kim, J
Kim, KW
Ree, M [1 ]
机构
[1] Pohang Univ Sci & Technol, Dept Chem, Pohang Accelerator Lab, Ctr Integrated Mol Syst, Pohang 790784, South Korea
[2] Pohang Univ Sci & Technol, Div Mol & Life Sci, Pohang 790784, South Korea
关键词
D O I
10.1002/adma.200400919
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A triethoxysilyl-terminated, six-armed poly(e-caprolactone) porogen is synthesized and the terminal groups are found to significantly reduce the aggregation of the porogen molecules in an organosilicate precursor via their hybridization reaction with the precursor. The porogen molecules successfully imprint nanopores in the organosilicate dielectric thin film (see Figure) through their sacrificial thermal decomposition.
引用
收藏
页码:696 / +
页数:7
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