A new hot carrier degradation law for MOSFET lifetime prediction

被引:11
作者
Marchand, B
Ghibaudo, G
Balestra, F
Guegan, G
Deleonibus, S
机构
[1] ENSERG, INPG, UMR,CNRS, Lab Phys Composants Semicond, F-38016 Grenoble 1, France
[2] CEA, LETI, F-38054 Grenoble, France
来源
MICROELECTRONICS AND RELIABILITY | 1998年 / 38卷 / 6-8期
关键词
D O I
10.1016/S0026-2714(98)00137-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We propose in this paper a new hot carrier degradation law for a reliable MOSFET lifetime prediction. We show that the proposed exponential function carl describe all kind of curve concavity (saturating or non-saturating shapes) and can fit very well with the experimental data for the whole duration of the stress. Finally, it gives a more accurate lifetime value as compared to-previous modelings because it accounts for the concavity of the saturating degradation law. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1103 / 1107
页数:5
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