Depositing graphene films on solid and perforated substrates

被引：27

作者：

Banerjee, A. ^{[1
]}

Grebel, H.

机构：

[1] New Jersey Inst Technol, Elect Imaging Ctr, Newark, NJ 07039 USA

来源：

NANOTECHNOLOGY | 2008年 / 19卷 / 36期

关键词：

D O I：

10.1088/0957-4484/19/36/365303

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Graphene-a monolayer of graphite-has attracted vast interest recently owing to its perfect two-dimensional crystallographic nature and its potential use in a new generation of microelectronic devices. Yet, a deposition method, which results in a large coverage of monolayer thick graphite, is still lacking. By using a chemical mechanical polishing (CMP) method we were able to deposit stress-free graphene on solid and perforated substrates alike, achieving area coverage of hundreds of microns squared.

引用

页数：5

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