Circuits using uniform TFTs based on amorphous In-Ga-Zn-O

被引:118
作者
Hayashi, Ryo [1 ]
Ofuji, Masato [1 ]
Kaji, Nobuyuki [1 ]
Takahashi, Kenji [1 ]
Abe, Katsumi [1 ]
Yabuta, Hisato [1 ]
Sano, Masafumi [1 ]
Kumomi, Hideya [1 ]
Nomura, Kenji [2 ]
Kamiya, Toshio [3 ]
Hirano, Masahiro [2 ]
Hosono, Hideo [3 ]
机构
[1] Canon Inc, Canon Res Ctr, Tokyo 1468501, Japan
[2] Tokyo Inst Technol, Frontier Collaborative Res Ctr, Japan Sci & Technol Agcy, ERATO,SORTS, Tokyo, Japan
[3] Tokyo Inst Technol, Mat & Struct Lab, Tokyo, Japan
关键词
thin-film transistors (TFTs); amorphous-oxide semiconductors; uniformity; sputtering; ring oscillators; organic light-emitting diodes (OLEDs);
D O I
10.1889/1.2812992
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-performance and excellent-uniformity thin-film transistors (TFTs) having bottom-gate structures are fabricated using an amorphous indium-gallium-zinc-oxide (IGZO) film and an amorphous-silicon dioxide film as the channel layer and the gate insulator layer, respectively. All of the 94 TFTs fabricated with an area 1 cm(2) show almost identical transfer characteristics: the average saturation mobility is 14.6 cm(2)/(V-sec) with a small standard deviation of 0.11 cm(2)/(V-sec). A five-stage ring-oscillator composed of these TFTs operates at 410 kHz at an input voltage of 18 V. Pixel-driving circuits based on these TFTs are also fabricated with organic light-emitting diodes (OLED) which are monolithically integrated on the same substrate. It is demonstrated that light emission from the OLED cells can be switched and modulated by a 120-Hz ac signal input. Amorphous-IGZO-based TFTs are prominent candidates for building blocks of large-area OLED-display electronics.
引用
收藏
页码:915 / 921
页数:7
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