Characterization of thin polymer films by X-ray reflectometry with synchrotron radiation

被引:7
作者
Kago, K [1 ]
Endo, H
Matsuoka, H
Yamaoka, H
Hamaya, N
Tanaka, M
Mori, T
机构
[1] Kyoto Univ, Dept Polymer Chem, Kyoto 6068501, Japan
[2] Ochanomizu Univ, Dept Phys, Tokyo 1128610, Japan
[3] Natl Lab High Energy Phys, Photon Factory, Tsukuba, Ibaraki 3050801, Japan
关键词
X-ray reflectivity; thin polymer films; Kiessig fringes; surface roughness; Fourier transform;
D O I
10.1107/S0909049598006797
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
X-ray reflectivity (XR) measurements with a synchrotron radiation source were carried out for thin polymer films on a glass plate. From the XR data, the film thickness and surface and interface roughnesses could be determined. In addition. the appropriate conditions and precision for measurements were also discussed. Kiessig fringes were observed clearly for specular XR measurements of poly(methylmethacrylate) thin film. Analysis of the XR data allowed the determination of the him thickness very precisely. By a curve-fitting procedure of the XR profile, the film-surface roughness and him-substrate interface roughnesses were determined. A Fourier transform of the XR data was performed as an alternative method of evaluating the him thickness. The values for the film thickness obtained by the curve-fitting procedure and Fourier-transform procedure were slightly different from each other. One possibility for the cause of this difference may be an integral error and/or cut-off effect in the Fourier-transform procedure. The;XR technique with synchrotron radiation is a very powerful tool for structural characterization of thin polymer films.
引用
收藏
页码:1304 / 1308
页数:5
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