Fabrication of atomic force microscope probe with low spring constant using SU-8 photoresist

被引：11

作者：

Lee, J

Shin, H

Kim, S

Hong, S

Chung, J

Park, H

Moon, J ^{[1
]}

机构：

[1] Yonsei Univ, Dept Ceram Engn, Seoul 120749, South Korea

[2] Kookmin Univ, Sch Adv Mat Engn, Seoul 136702, South Korea

[3] Samsung Adv Inst Technol, Suwon 440600, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2003年 / 42卷 / 10A期

关键词：

AFM; cantilever; SU-8; SAMs; spring constant;

D O I：

10.1143/JJAP.42.L1171

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Microfabrication processes of atomic force microscope (AFM) probe using SU-8 photoresist have been developed. Photolithographic patterning of the SU-8 on the anisotropically etched Si substrate produced the AFM cantilever with integrated tip. Use of the self-assembled monolayers and Al interlayer between the SU-8 and the Si substrate played a significant role for retrieving the probe out of the Si micromold without any damage. Fabricated SU-8 probe with a relatively sharp tip (radius of curvature similar to80 nm) had a resonant frequency of 44 kHz, which yields a spring constant of 0.248 N/m.

引用

收藏

页码：L1171 / L1174

页数：4

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