Process control during diamond coating of tools

被引：15

作者：

Deuerler, F

Peterseim, J

Gruner, H

Wang, Q

Buck, V

机构：

[1] FB Maschinenbau, Fachhsch Gelsenkirchen, Abt Bocholt, D-46364 Bocholt, Germany

[2] Krupp Thyssen Nirosta Gmbh, D-40597 Dusseldorf, Germany

[3] Medicoat AG, Gewerbe Nord, CH-5506 Magenwil, Switzerland

[4] Univ GH Essen, Fachbereich Phys, D-45117 Essen, Germany

来源：

INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 1998年 / 16卷 / 03期

关键词：

diamond film; plasma jet CVD; process parameters; tools; low pressure synthesis;

D O I：

10.1016/S0263-4368(98)00019-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The plasma jet CVD process is especially suited for the low pressure synthesis of diamond films from the vapour phase due to its high deposition rate. The process parameters as e.g. gas composition and pressure in the reaction chamber, temperature of the substrate and of the gas phase, have to be adjusted very carefully due to the intimate correlations between them. If set correctly this technique allows the high quality diamond coating of tools with complex shape, even with big coating areas. (C) 1998 Elsevier Science Ltd. All rights reserved.

引用

页码：191 / 199

页数：9

共 18 条

[1] DIAMOND DEPOSITION TECHNOLOGIES [J].