Scanning room-temperature photoluminescence in polycrystalline silicon

被引:42
作者
Koshka, Y [1 ]
Ostapenko, S
Tarasov, I
McHugo, S
Kalejs, JP
机构
[1] Univ S Florida, Ctr Microelect Res, Tampa, FL 33620 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[3] ASE Amer Inc, Billerica, MA 01821 USA
关键词
D O I
10.1063/1.123614
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence (PL) mapping was performed on polycrystalline silicon wafers at room temperature. Two PL bands are observed: (1) a band-to-band emission with a maximum at 1.09 eV, and (2) a deep "defect'' luminescence at about 0.8 eV. PL mapping of 10 cm x 10 cm wafers revealed inhomogeneity of the band-to-band PL intensity which could be correlated to the distribution of minority carrier diffusion length in the wafer bulk. We have also observed that the intensity of the 0.8 eV band is strongest along those grain boundaries where the band-to-band PL is suppressed as well as minority carrier diffusion length. The origin of the 0.8 eV luminescence band is discussed. (C) 1999 American Institute of Physics. [S0003-6951(99)00611-7].
引用
收藏
页码:1555 / 1557
页数:3
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