Near-field photochemical imaging of noble metal nanostructures

被引:186
作者
Hubert, C
Rumyantseva, A
Lerondel, G
Grand, J
Kostcheev, S
Billot, L
Vial, A
Bachelot, R
Royer, P
Chang, SH
Gray, SK
Wiederrecht, GP
Schatz, GC
机构
[1] Univ Technol Troyes, CNRS, FRE 2671, Lab Nanotechnol & Instrumentat Opt, F-10010 Troyes, France
[2] Argonne Natl Lab, Div Chem, Argonne, IL 60439 USA
[3] Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA
[4] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
[5] Northwestern Univ, Inst Nanotechnol, Evanston, IL 60208 USA
关键词
D O I
10.1021/nl047956i
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The sub-diffraction imaging of the optical near-field in nanostructures, based on a photochemical technique, is reported. A photosensitive azobenzene-dye polymer is spin coated onto lithographic structures and is subsequently irradiated with laser light. Photoinduced mass transport creates topographic modifications at the polymer film surface that are then measured with atomic force microscopy (AFM). The AFM images correlate with rigorous theoretical calculations of the near-field intensities for a range of different nanostructures and illumination polarizations. This approach is a first step toward additional methods for resolving confined optical near fields, which can augment scanning probe methodologies for high spatial resolution of optical near fields.
引用
收藏
页码:615 / 619
页数:5
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