Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: Modeling and comparison with experiment

被引:17
作者
Bogaerts, A
Naylor, J
Hatcher, M
Jones, WJ
Mason, R
机构
[1] Univ Instelling Antwerp, Dept Chem, B-2610 Wilrijk, Belgium
[2] Univ Wales, Dept Chem, Swansea SA2 8PP, W Glam, Wales
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 04期
关键词
D O I
10.1116/1.581359
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Two-dimensional sputtered lithium atom density profiles have been calculated with a model for an argon glow discharge. Since the value of the sticking coefficient of sputtered atoms at the cell walls, which is needed as the boundary condition for calculating the behavior of the sputtered atoms, is not available from the literature, the calculations were performed for a range of sticking coefficient values. It is found that this parameter has a significant effect on the calculation results, and accurate knowledge of its value would therefore be required for an exact description of the behavior of sputtered atoms in a glow discharge. The density profiles calculated have also been compared with experimental results, obtained with concentration-modulated absorption spectrometry at the same discharge conditions and in the same cell geometry, in order to try to make reasonable estimates for the sticking coefficients. (C) 1998 American Vacuum Society. [S0734-2101(98)05704-2].
引用
收藏
页码:2400 / 2410
页数:11
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