The electronic structure of tantalum (oxy)nitrides TaON and Ta3N5

被引:173
作者
Fang, CM
Orhan, E
de Wijs, GA
Hintzen, HT
de Groot, RA
Marchand, R
Saillard, JY
de With, G
机构
[1] Eindhoven Univ Technol, Lab Solid State & Mat Chem, NL-5600 MB Eindhoven, Netherlands
[2] Univ Rennes 1, Inst Chim, Lab Verres & Ceram, CNRS,UMR 6512, F-35042 Rennes, France
[3] Univ Nijmegen, Inst Mat Res, NL-6525 ED Nijmegen, Netherlands
[4] Univ Rennes 1, Inst Chim, Chim Solide & Inorgan Mol Lab, CNRS,UMR 6511, F-35042 Rennes, France
关键词
D O I
10.1039/b005751g
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Detailed results of ab initio band structure calculations for tantalum (oxy)nitrides (TaON and Ta3N5) are reported. The calculations are performed within the framework of density functional theory (DFT). We compare results obtained with the molecular dynamics pseudopotential (PP) approach of the Vienna Ab initio Simulation Program (VASP) and the Full Potential Linearized Augmented Plane Waves method (FP-LAPW) using the WIEN97 program. In agreement with neutron diffraction measurements, we show an ordering of the anions in TaON. The calculations also show that the valence band is composed mainly of the anion 2p orbitals hybridized with Ta 5d states. For TaON the top of the valence band is dominated by N 2p states. The bottom of the conduction band is mainly composed of Ta 5d states. Both TaON and Ta3N5 are semiconductors with calculated indirect band gaps of respectively 1.8 and 1.1eV (VASP calculations) and 2.0 and 1.2eV (WIEN97 calculations). Optical diffuse-reflectance spectra show an energy gap of 2.08eV for Ta3N5.
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收藏
页码:1248 / 1252
页数:5
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