Structure characterization of vanadium oxide thin films prepared by magnetron sputtering methods

被引：97

作者：

Cui, JZ ^{[1
]}

Da, DA ^{[1
]}

Jiang, WS ^{[1
]}

机构：

[1] Lanzhou Inst Phys, Lanzhou 730000, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 1998年 / 133卷 / 03期

关键词：

vanadium oxides; polycrystalline; atomic force microscopy;

D O I：

10.1016/S0169-4332(98)00201-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Vanadium oxides thin films prepared by magnetron sputtering methods have been studied with X-ray photoelectron spectroscopy, atomic force microscopy and X-ray diffraction. The phases of vanadium oxide films were related to the V2p(3/2) binding energy in the XPS. The AFM images of polycrystalline vanadium dioxide surface were given. The electronic, micro and macro properties of VO2 thin film are coincident with its optical and electrical measurement. (C) 1998 Elsevier Science B.V. All sights reserved.

引用

页码：225 / 229

页数：5

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