Depletion-type thin-film transistors with a ferroelectric insulator

被引:79
作者
Prins, MWJ [1 ]
Zinnemers, SE [1 ]
Cillessen, JFM [1 ]
Giesbers, JB [1 ]
机构
[1] EINDHOVEN UNIV TECHNOL,DEPT APPL PHYS,NL-5600 MB EINDHOVEN,NETHERLANDS
关键词
D O I
10.1063/1.118180
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a study of electrical characteristics of ferroelectric field-effect transistors made of PbZr0.2Ti0.8O3 and SnO2:Sb thin films. Due to properly chosen semiconductor parameters, the transistor channel can be totally depleted by the ferroelectric charge displacement. The observed remnant on/off ratio of the channel current amounts to 7 x 10(3). Pulse response measurements give information on data retention, device speed, and the occurrence of charge injection. The results lead to important design considerations for ferroelectric transistors. (C) 1997 American Institute of Physics.
引用
收藏
页码:458 / 460
页数:3
相关论文
共 15 条
  • [1] FERROELECTRIC FIELD-EFFECT IN EPITAXIAL THIN-FILM OXIDE SRCUO2/PB(ZR0.52TI0.48)O-3 HETEROSTRUCTURES
    AHN, CH
    TRISCONE, JM
    ARCHIBALD, N
    DECROUX, M
    HAMMOND, RH
    GEBALLE, TH
    FISCHER, O
    BEASLEY, MR
    [J]. SCIENCE, 1995, 269 (5222) : 373 - 376
  • [2] CERAMIC FERROELECTRIC FIELD EFFECT STUDIES
    CRAWFORD, JC
    ENGLISH, FL
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (06) : 525 - &
  • [3] DONG ZW, IN PRESS
  • [4] GrosseHolz KO, 1996, MATER RES SOC SYMP P, V401, P67
  • [5] TRANSIENT-BEHAVIOR AND MEMORY EFFECT OF A PBZRXTI1-XO3/YBA2CU3O7-X 3-TERMINAL DEVICE
    LIN, H
    WU, NJ
    XIE, K
    LI, XY
    IGNATIEV, A
    [J]. APPLIED PHYSICS LETTERS, 1994, 65 (08) : 953 - 955
  • [6] FERROELECTRIC MEMORY FET WITH IR/IRO2 ELECTRODES
    NAKAMURA, T
    NAKAO, Y
    KAMISAWA, A
    TAKASU, H
    [J]. INTEGRATED FERROELECTRICS, 1995, 9 (1-3) : 179 - 187
  • [7] STUDY ON FERROELECTRIC THIN-FILMS FOR APPLICATION TO NDRO NONVOLATILE MEMORIES
    NAKAO, Y
    NAKAMURA, T
    KAMISAWA, A
    TAKASU, H
    [J]. INTEGRATED FERROELECTRICS, 1995, 6 (1-4) : 23 - 34
  • [8] A ferroelectric transparent thin-film transistor
    Prins, MWJ
    GrosseHolz, KO
    Muller, G
    Cillessen, JFM
    Giesbers, JB
    Weening, RP
    Wolf, RM
    [J]. APPLIED PHYSICS LETTERS, 1996, 68 (25) : 3650 - 3652
  • [9] MECHANISMS FOR THE OPERATION OF THIN-FILM TRANSISTORS ON FERROELECTRICS
    SEAGER, CH
    MCINTYRE, D
    TUTTLE, BA
    EVANS, J
    [J]. INTEGRATED FERROELECTRICS, 1995, 6 (1-4) : 47 - 68
  • [10] Seager CH, 1996, APPL PHYS LETT, V68, P2660, DOI 10.1063/1.116273