Dielectric function spectra of GaN, AlGaN, and GaN/AlGaN heterostructures

被引:43
作者
Wagner, J
Obloh, H
Kunzer, M
Maier, M
Köhler, K
Johs, B
机构
[1] Fraunhofer Inst Angew Festkorperphys, D-79108 Freiburg, Germany
[2] JA Woollam Co Inc, Lincoln, NE 68508 USA
关键词
D O I
10.1063/1.1342022
中图分类号
O59 [应用物理学];
学科分类号
摘要
The pseudodielectric function spectra [epsilon] of wurtzite GaN, AlGaN, and GaN/AlGaN heterostructures were determined for photon energies ranging from 2 to 5 eV, using variable angle spectroscopic ellipsometry (SE). Samples were grown by low-pressure metalorganic chemical vapor deposition on c-plane sapphire substrates. The experimental [epsilon] spectra were analyzed using a multilayer approach, describing the dielectric functions of the individual layers by a parametric oscillator model. In this way, parametric dielectric function spectra of GaN and AlxGa1-xN (x less than or equal to 0.16) were derived, as well as the composition dependence of the AlxGa1-xN band gap energy. The SE band gap data were found to be consistent with a bowing parameter close to 1 eV. Finally, the GaN and AlxGa1-xN parametric dielectric functions were used to quantitatively analyze the pseudodielectric function spectrum of GaN/AlGaN modulation doped field effect transistor structures, demonstrating the potential of SE in combination with a multilayer parametric dielectric function model for nondestructive ex situ control of GaN/AlGaN device structures. (C) 2001 American Institute of Physics.
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页码:2779 / 2785
页数:7
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