Reduction in the reset current in a resistive random access memory consisting of NiOx brought about by reducing a parasitic capacitance

被引:204
作者
Kinoshita, K. [1 ]
Tsunoda, K. [1 ]
Sato, Y. [1 ]
Noshiro, H. [1 ]
Yagaki, S. [1 ]
Aoki, M. [1 ]
Sugiyama, Y. [1 ]
机构
[1] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
关键词
D O I
10.1063/1.2959065
中图分类号
O59 [应用物理学];
学科分类号
摘要
The dependence of the relationship between the reset current I(reset) and the compliance current I(comp) (I(reset)-I(comp) characteristic) of a Pt/NiO(x)/Pt structure on the parasitic capacitance between the Pt/NiO(x)/Pt structure and a current limiter C was measured for I(comp)< 1 mA. It was clarified that C deviated the I(reset)-I(comp) characteristic from the ideal linear relationship expected for C=0 and I(reset) saturated at higher I(comp) for larger C. This is attributed to a transient current flowing through C when the forming or set transitions occurred. The relationship of I(reset)approximate to I(comp) was maintained down to I(comp)=150 mu A in the 1T1R cell with very small C. (C) 2008 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 9 条
  • [1] Baek IG, 2005, INT EL DEVICES MEET, P769
  • [2] Highly scalable non-volatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses
    Baek, IG
    Lee, MS
    Seo, S
    Lee, MJ
    Seo, DH
    Suh, DS
    Park, JC
    Park, SO
    Kim, HS
    Yoo, IK
    Chung, UI
    Moon, JT
    [J]. IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, : 587 - 590
  • [3] Fang T.-N., 2006, IEDM, P1, DOI [10.1109/IEDM.2006.346731, DOI 10.1109/IEDM.2006.346731]
  • [4] Reasons for obtaining an optical dielectric constant from the Poole-Frenkel conduction behavior of atomic-layer-deposited HfO2 films -: art. no. 0729030
    Jeong, DS
    Park, HB
    Hwang, CS
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (07) : 1 - 3
  • [5] Improvement of resistive memory switching in NiO using IrO2
    Kim, D. C.
    Lee, M. J.
    Ahn, S. E.
    Seo, S.
    Park, J. C.
    Yoo, I. K.
    Baek, I. G.
    Kim, H. J.
    Yim, E. K.
    Lee, J. E.
    Park, S. O.
    Kim, H. S.
    Chung, U-In
    Moon, J. T.
    Ryu, B. I.
    [J]. APPLIED PHYSICS LETTERS, 2006, 88 (23)
  • [6] KINOSHITA K, 2006, P IEEE NONV SEM MEM, P84
  • [7] Sub-1100-μA reset current of nickel oxide resistive memory through control of filamentary conductance by current limit of MOSFET
    Sato, Yoshihiro
    Tsunoda, Koji
    Kinoshita, Kentaro
    Noshiro, Hideyuki
    Aoki, Masaki
    Sugiyama, Yoshihiro
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2008, 55 (05) : 1185 - 1191
  • [8] Reproducible resistance switching in polycrystalline NiO films
    Seo, S
    Lee, MJ
    Seo, DH
    Jeoung, EJ
    Suh, DS
    Joung, YS
    Yoo, IK
    Hwang, IR
    Kim, SH
    Byun, IS
    Kim, JS
    Choi, JS
    Park, BH
    [J]. APPLIED PHYSICS LETTERS, 2004, 85 (23) : 5655 - 5657
  • [9] Low power and high speed switching of Ti-doped NiOReRAM under the unipolar voltage source of less than 3 V
    Tsunoda, K.
    Kinoshita, K.
    Noshiro, H.
    Yamazaki, Y.
    Iizuka, T.
    Ito, Y.
    Takahashi, A.
    Okano, A.
    Sato, Y.
    Fukano, T.
    Aoki, M.
    Sugiyama, Y.
    [J]. 2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2007, : 767 - +