Poly(p-phenylene vinylene) copolymer patterns prepared via photolithographic techniques

被引：9

作者：

Renak, ML

Bazan, GC ^{[1
]}

Roitman, D

机构：

[1] Univ Rochester, Dept Chem, Rochester, NY 14627 USA

[2] Hewlett Packard Labs, Solid State Technol Lab, Palo Alto, CA 94303 USA

来源：

SYNTHETIC METALS | 1998年 / 97卷 / 01期

关键词：

microlithography; patterning; poly(paracyclophene); triphenylsulfonium triflate; poly(phenylene vinylene); fluorescence lifetimes;

D O I：

10.1016/S0379-6779(98)00104-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Standard microlithographic techniques can be used for the spatially controlled light-directed synthesis of poly(p-phenylene vinylene) (PPV) block copolymers. Microscalar linear and circular patterns can be prepared in the 25 mu m range. The success of the overall procedure rests on the photogeneration of triflic acid from triphenylsulfonium trifluoromethanesulfonate in a poly(9-hydroxy-[2.2]paracyclophan-1-ene) matrix to catalyze the formation of PPV. Absorption and photoluminescence studies were performed to demonstrate the efficiency of the conversion of the precursor polymer to PPV throughout the photolithographic sequence. FT-IR and UV-Vis data are also presented that illustrate how the precursor poly(paracyclophenes) can be patterned for certain block copolymer ratios in the absence of a photoacid generator. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：17 / 21

页数：5

共 23 条

[1] Fluorescence quantum yield of poly(p-phenylenevinylene) prepared via the paracyclophene route: Effect of chain length and interchain contacts [J].