Experimental investigation of the chemistry in a capacitively coupled hydrocarbon/oxygen radio frequency discharge

被引:19
作者
Busch, C [1 ]
Möller, I [1 ]
Soltwisch, H [1 ]
机构
[1] Ruhr Univ Bochum, Inst Expt Phys AG Laser & Plasmaphys 5, D-44780 Bochum, Germany
关键词
D O I
10.1088/0963-0252/10/2/314
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The densities and temperatures of methane, oxygen, the methyl radical, carbon monoxide and carbon dioxide have been measured using absorption spectroscopy in a capacitively coupled radio frequency (rf) (13.56 MHz) discharge with varied mixtures of methane and molecular oxygen as feed gases under flowing conditions (flow rate less than or equal to 10 seem, total pressure 100 Pa, input power less than or equal to 80 W). Whereas neither translational nor rovibrational temperatures rise much above room temperature, up to 90% of the feed gas species are dissociated, and the methyl radical attains densities of the order of 10(17)-10(18) m(-3). The observed depletion of the feed gases and the production of methyl as a function of the applied rf power are described consistently by means of analytical expressions derived from simple rate equations of the volume chemistry: Some experimental findings, however, cannot be explained by volume reactions only, indicating that surface processes probably play an important role in the overall plasma chemistry.
引用
收藏
页码:250 / 259
页数:10
相关论文
共 35 条
[1]   EVALUATED KINETIC DATA FOR COMBUSTION MODELING SUPPLEMENT-I [J].
BAULCH, DL ;
COBOS, CJ ;
COX, RA ;
FRANK, P ;
HAYMAN, G ;
JUST, T ;
KERR, JA ;
MURRELLS, T ;
PILLING, MJ ;
TROE, J ;
WALKER, RW ;
WARNATZ, J .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1994, 23 (06) :847-1033
[2]  
Busch C, 2000, CONTRIB PLASM PHYS, V40, P81, DOI 10.1002/(SICI)1521-3986(200004)40:1/2<81::AID-CTPP81>3.0.CO
[3]  
2-7
[4]  
BUSCH C, 1999, P 9 INT S LAS AID PL, P92
[5]  
BUSCH C, 1999, THESIS RUHR U BOCHUM
[6]   Radical and film growth kinetics in methane radio-frequency glow discharges [J].
Dagel, DJ ;
Mallouris, CM ;
Doyle, JR .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (11) :8735-8747
[7]   INFRARED-LASER DIAGNOSTICS IN METHANE CHEMICAL-VAPOR-DEPOSITION PLASMAS [J].
DAVIES, PB ;
MARTINEAU, PM .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (12) :6125-6135
[8]   Effect of oxygen on methyl radical concentrations in a CH4/H-2 chemical vapor deposition reactor studied by infrared diode laser spectroscopy [J].
Fan, WY ;
Ropcke, J ;
Davies, PB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (05) :2970-2972
[9]   A diode laser and modeling study of mixed (CH4-H2-O2) AC plasmas [J].
Fan, WY ;
Knewstubb, PF ;
Käning, M ;
Mechold, L ;
Röpcke, J ;
Davies, PB .
JOURNAL OF PHYSICAL CHEMISTRY A, 1999, 103 (20) :4118-4128
[10]  
FAN WY, 1997, THESIS U CAMBRIDGE