Effect of oxygen on methyl radical concentrations in a CH4/H-2 chemical vapor deposition reactor studied by infrared diode laser spectroscopy

被引：15

作者：

Fan, WY

Ropcke, J

Davies, PB

机构：

[1] UNIV CAMBRIDGE,CHEM LAB,CAMBRIDGE CB2 1EW,ENGLAND

[2] INST LOW TEMP PLASMA PHYS,D-17489 GREIFSWALD,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 05期

关键词：

D O I：

10.1116/1.580255

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

[No abstract available]

引用

页码：2970 / 2972

页数：3

共 17 条

[1]

Angus JohnC., 1986, Plasma deposited thin films: Carbon thin films, P89

[2] EVALUATED KINETIC DATA FOR COMBUSTION MODELING [J].

BAULCH, DL ;

COBOS, CJ ;

COX, RA ;

ESSER, C ;

FRANK, P ;

JUST, T ;

KERR, JA ;

PILLING, MJ ;

TROE, J ;

WALKER, RW ;

WARNATZ, J .

JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1992, 21 (03) :411-734

[3]

BRASSINGTON DJ, COMMUNICATION

[4]

CURTIS AR, 1987, FACSIMILE USER MANUA

[5] INFRARED-LASER DIAGNOSTICS IN METHANE CHEMICAL-VAPOR-DEPOSITION PLASMAS [J].

DAVIES, PB ;

MARTINEAU, PM .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (12) :6125-6135

[6] INFRARED DIODE-LASER DIAGNOSTICS OF METHANE PLASMAS PRODUCED IN A DEPOSITION REACTOR [J].

DAVIES, PB ;

MARTINEAU, PM .

APPLIED PHYSICS LETTERS, 1990, 57 (03) :237-239

[7]

FAN W, UNPUB

[8] The calculation of normal cathode decline in gas mixtures [J].

Gunther-Schulze, A .

ZEITSCHRIFT FUR PHYSIK, 1924, 21 :50-59

[9] ELECTRON AND CHEMICAL-KINETICS IN METHANE RF GLOW-DISCHARGE DEPOSITION PLASMAS [J].

KLINE, LE ;

PARTLOW, WD ;

BIES, WE .

JOURNAL OF APPLIED PHYSICS, 1989, 65 (01) :70-78

[10] OBSERVATION OF CH2 RADICAL AND COMPARISON WITH CH3 RADICAL IN A RF METHANE DISCHARGE [J].

KOJIMA, H ;

TOYODA, H ;

SUGAI, H .

APPLIED PHYSICS LETTERS, 1989, 55 (13) :1292-1294

← 1 2 →