INFRARED DIODE-LASER DIAGNOSTICS OF METHANE PLASMAS PRODUCED IN A DEPOSITION REACTOR

被引：24

作者：

DAVIES, PB

MARTINEAU, PM

机构：

[1] Department of Chemistry, University of Cambridge, Cambridge CB2 1EW, Lensfield Road

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 03期

关键词：

D O I：

10.1063/1.103727

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Tunable infrared diode laser spectroscopy has been applied to the study of CH4 plasmas generated in a deposition reactor run at 20 kHz. Absolute number densities of CH4, C2H4, and CH 3 have been measured as functions of pressure and current. A qualitative explanation of the results is presented.

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页码：237 / 239

页数：3

相关论文

共 8 条

[1] INSITU, REAL-TIME DIAGNOSTICS OF OMVPE USING IR-DIODE LASER SPECTROSCOPY [J].

BUTLER, JE ;

BOTTKA, N ;

SILLMON, RS ;

GASKILL, DK .

JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :163-171

[2] INFRARED DETECTION OF GASEOUS SPECIES DURING THE FILAMENT-ASSISTED GROWTH OF DIAMOND [J].

CELII, FG ;

PEHRSSON, PE ;

WANG, HT ;

BUTLER, JE .

APPLIED PHYSICS LETTERS, 1988, 52 (24) :2043-2045

[3] SIMULTANEOUS ANALYSIS OF NU2 AND NU4 BANDS OF METHANE [J].

GRAY, DL ;

ROBIETTE, AG .

MOLECULAR PHYSICS, 1976, 32 (06) :1609-1625

[4] ELECTRON AND CHEMICAL-KINETICS IN METHANE RF GLOW-DISCHARGE DEPOSITION PLASMAS [J].

KLINE, LE ;

PARTLOW, WD ;

BIES, WE .

JOURNAL OF APPLIED PHYSICS, 1989, 65 (01) :70-78

[5] STUDY OF THE RECOMBINATION REACTION CH3+CH3-]C2H6 .1. EXPERIMENT [J].

SLAGLE, IR ;

GUTMAN, D ;

DAVIES, JW ;

PILLING, MJ .

JOURNAL OF PHYSICAL CHEMISTRY, 1988, 92 (09) :2455-2462

[6] A MEASUREMENT OF THE STRENGTH OF THE V2 BAND OF CH3 [J].

WORMHOUDT, J ;

MCCURDY, KE .

CHEMICAL PHYSICS LETTERS, 1989, 156 (01) :47-50

[7]

WORMHOUDT J, MRS S P, V165

[8] DIODE-LASER STUDY OF THE NU-2 BAND OF THE METHYL RADICAL [J].

YAMADA, C ;

HIROTA, E ;

KAWAGUCHI, K .

JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (11) :5256-5264