Fabrication of a miniaturized electron lens system and laser micro-machining condition for silicon membrane

被引:9
作者
Ahn, S
Kim, DW [1 ]
Kim, HS
Ahn, SJ
Cho, J
机构
[1] Sun Moon Univ, Dept Phys, Ctr Next Generat Semiconductor Technol, Chungnam 336840, South Korea
[2] Sun Moon Univ, Div Elect Informat & Commun Engn, Chungnam 336840, South Korea
[3] Kwangwoon Univ, Dept Electrophys, Seoul 139701, South Korea
关键词
microcolumn; electrostatic electron lens; laser micro-machining; active Q-switched Nd : YAG laser;
D O I
10.1016/S0167-9317(03)00229-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For a miniaturized electron beam system application, miniaturized electrostatic electron lenses and their assembly, called a microcolumn, have been fabricated using an active Q-switched 1.06 mum Nd:YAG pulsed laser beam. The laser micro-machining condition for 20 mum thick Si membrane has been investigated by varying the pulse width and the effect of power density will be discussed. The geometrical structures of laser micro-machined electron lenses such as diameter, the roundness of the aperture wall and the degree of the thermal distortion are thought to be dependent on the characteristics of the individual laser pulse. A successful alignment of electron lenses using a simple laser diffraction pattern will be reported, also. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:57 / 64
页数:8
相关论文
共 19 条
[1]   Experimental studies on the pulse compression characteristics of an additive-pulse mode-locked CW Nd:YLF laser [J].
Ahn, SJ ;
Kwak, HW .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (7A) :L789-L791
[2]   Laser fabrication of micron-size apertures for electron beam microcolumns [J].
Ahn, SJ ;
Kim, DW ;
Kim, HS ;
Cho, KH ;
Choi, SS .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (Suppl 1) :S527-S530
[3]  
[Anonymous], 1997, IND APPL LASERS
[4]   INTERACTION OF CO2-LASER PULSES OF MICROSECOND DURATION WITH AL2O3 CERAMIC SUBSTRATES [J].
BEYER, H ;
ROSS, W ;
RUDOLPH, R ;
MICHAELIS, A ;
UHLENBUSCH, J ;
VIOL, W .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (01) :75-81
[5]   Electron-beam microcolumns for lithography and related applications [J].
Chang, THP ;
Thomson, MGR ;
Kratschmer, E ;
Kim, HS ;
Yu, ML ;
Lee, KY ;
Rishton, SA ;
Hussey, BW ;
Zolgharnain, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :3774-3781
[6]   ARRAYED MINIATURE ELECTRON-BEAM COLUMNS FOR HIGH THROUGHPUT SUB-100 NM LITHOGRAPHY [J].
CHANG, THP ;
KERN, DP ;
MURAY, LP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2743-2748
[7]   Electron beam technology - SEM to microcolumn [J].
Chang, THP ;
Thomson, MGR ;
Yu, ML ;
Kratschmer, E ;
Kim, HS ;
Lee, KY ;
Rishton, SA ;
Zolgharnain, S .
MICROELECTRONIC ENGINEERING, 1996, 32 (1-4) :113-130
[8]   INTERACTION OF HIGH-INTENSITY LASER BEAMS WITH METALS [J].
CHUN, MK ;
ROSE, K .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (02) :614-&
[9]   MICROMACHINED ELECTROSTATIC ELECTRON SOURCE [J].
CREWE, DA ;
PERNG, DC ;
SHOAF, SE ;
FEINERMAN, AD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :2754-2758
[10]   HIGH-INTENSITY LASER-INDUCED VAPORIZATION AND EXPLOSION OF SOLID MATERIAL [J].
DABBY, FW ;
PAEK, U .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1972, QE 8 (02) :106-&