Electron beam technology - SEM to microcolumn

被引：41

作者：

Chang, THP ^{[1
]}

Thomson, MGR ^{[1
]}

Yu, ML ^{[1
]}

Kratschmer, E ^{[1
]}

Kim, HS ^{[1
]}

Lee, KY ^{[1
]}

Rishton, SA ^{[1
]}

Zolgharnain, S ^{[1
]}

机构：

[1] COLUMBIA UNIV,DEPT ELECT ENGN,NEW YORK,NY 10027

来源：

MICROELECTRONIC ENGINEERING | 1996年 / 32卷 / 1-4期

关键词：

electron optics; lithography; field emission sources; scanning electron microscope; microfabrication;

D O I：

10.1016/0167-9317(95)00366-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

As a continued effort to improve the performance of low energy scanning electron probe systems for application in microscopy, lithography, metrology, etc., miniaturized electron beam columns, approximately 3 mm in length, demonstrating a probe size of 10 nm with a beam current of greater than or equal to 1 nA at 1 keV, have been successfully developed. This paper presents current status, future directions and potential applications of these microcolumns.

引用

页码：113 / 130

页数：18

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