Electron beam technology - SEM to microcolumn

被引：41

作者：

Chang, THP ^{[1
]}

Thomson, MGR ^{[1
]}

Yu, ML ^{[1
]}

Kratschmer, E ^{[1
]}

Kim, HS ^{[1
]}

Lee, KY ^{[1
]}

Rishton, SA ^{[1
]}

Zolgharnain, S ^{[1
]}

机构：

[1] COLUMBIA UNIV,DEPT ELECT ENGN,NEW YORK,NY 10027

来源：

MICROELECTRONIC ENGINEERING | 1996年 / 32卷 / 1-4期

关键词：

electron optics; lithography; field emission sources; scanning electron microscope; microfabrication;

D O I：

10.1016/0167-9317(95)00366-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

As a continued effort to improve the performance of low energy scanning electron probe systems for application in microscopy, lithography, metrology, etc., miniaturized electron beam columns, approximately 3 mm in length, demonstrating a probe size of 10 nm with a beam current of greater than or equal to 1 nA at 1 keV, have been successfully developed. This paper presents current status, future directions and potential applications of these microcolumns.

引用

页码：113 / 130

页数：18

共 32 条

[21]

MARTIN JP, 1994, MICROSCOPY ANAL, V43

[22] REQUIREMENTS AND PERFORMANCE OF AN ELECTRON-BEAM COLUMN DESIGNED FOR X-RAY MASK INSPECTION [J].

MEISBURGER, WD ;

DESAI, AA ;

BRODIE, AD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3010-3014

[23]

ORLOFF J, 1984, SCANNING ELECTRON MI, V4, P1585

[24] MINIATURIZED E-BEAM WRITER -TESTING OF COMPONENTS [J].

STEBLER, C ;

DESPONT, M ;

STAUFER, U .

MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) :155-158

[25] COMPARATIVE STUDY OF ZIRCONIATED AND BUILT-UP W THERMALFIELD CATHODE [J].

SWANSON, LW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1228-1233

[26] RECENT PROGRESS IN THERMAL FIELD ELECTRON SOURCE PERFORMANCE [J].

SWANSON, LW ;

TUGGLE, D .

APPLIED SURFACE SCIENCE, 1981, 8 (1-2) :185-196

[27]

THOMSON MGR, 1995, J VAC SCI TECHNO NOV

[28]

THOMSON MGR, 1994, J VAC SCI TECHNOL B, V12, P3468

[29] FIELD ASSISTED GLASS-METAL SEALING [J].

WALLIS, G ;

POMERANT.DI .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (10) :3946-&

[30] EMISSION CHARACTERISTICS OF ULTRASHARP COLD FIELD EMITTERS [J].

YU, ML ;

HUSSEY, BW ;

KIM, HS ;

CHANG, THP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (06) :3431-3435

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