Structural investigation on implanted copper ions in silica glass by XAFS spectroscopy

被引：16

作者：

Fukumi, K

Chayahara, A

Kadono, K

Kageyama, H

Akai, T

Kitamura, N

Makihara, M

Fujii, K

Hayakawa, J

机构：

[1] Osaka National Research Institute, AIST, Ikeda, Osaka 563-8577

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1998年 / 238卷 / 1-2期

关键词：

D O I：

10.1016/S0022-3093(98)00576-6

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The chemical state and coordination state of copper ions have been studied in 2 MeV, 1 x 10(17) Cu+ ions/cm(2-)implanted silica glass by X-ray absorption fine structure spectroscopy. It was found that the implanted Cu atoms are mainly present as Cu(I) state in the glass from the comparison of X-ray absorption near edge structure spectrum of the glass with those of CuO, Cu2O, CuAlO2, CuFeO2, Ca2CuO3 and MgCu2O3 crystals. We inferred from the extended X-ray absorption fine structure spectra that the implanted Cu atoms are coordinated by two oxygen atoms and the Cu-O interatomic distance is 0.188 nm in the glass. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

收藏

页码：143 / 151

页数：9

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