Chemistry and kinetics of chemical vapor deposition of pyrocarbon - V - Influence of reactor volume/deposition surface area ratio

被引:62
作者
Becker, A [1 ]
Huttinger, KJ [1 ]
机构
[1] Univ Karlsruhe, Inst Chem Tech, D-76128 Karlsruhe, Germany
关键词
pyrolytic carbon; chemical vapor deposition;
D O I
10.1016/S0008-6223(97)00178-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Pyrocarbon deposition from methane was studied at ambient pressure and a temperature of 1100 degrees C using a vertical hot-wall reactor with a honeycomb structure as substrate. Compared to the deposition tube used in previous studies this substrate exhibits a 15-fold increase in surface area. The methane initial partial pressure was varied up to 75 kPa, and the residence time up to 1 second. The results are compared with those obtained with the tube. The surface area is shown to decisively influence the chemistry and kinetics of deposition reactions and thus also the major growth species of pyrocarbon. With residence time increasing from zero to one second the ratio of surface-related pyrocarbon deposition rates obtained with tube and honeycomb structure vary by a factor of about 18. With increasing initial partial pressure, deposition rates tend to approach a limiting value indicating saturation adsorption. Pyrocarbon deposition rates as a function of residence time and initial partial pressure have been simulated considering complex homogeneous and heterogeneous reactions. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:225 / 232
页数:8
相关论文
共 9 条
[1]   Chemistry and kinetics of chemical vapor deposition of pyrocarbon - IV - Pyrocarbon deposition from methane in the low temperature regime [J].
Becker, A ;
Huttinger, KJ .
CARBON, 1998, 36 (03) :213-224
[2]   Chemistry and kinetics of chemical vapor deposition of pyrocarbon - III - Pyrocarbon deposition from propylene and benzene in the low temperature regime [J].
Becker, A ;
Huttinger, KJ .
CARBON, 1998, 36 (03) :201-211
[3]   Chemistry and kinetics of chemical vapor deposition of pyrocarbon - II - Pyrocarbon deposition from ethylene, acetylene and 1,3-butadiene in the low temperature regime [J].
Becker, A ;
Huttinger, KJ .
CARBON, 1998, 36 (03) :177-199
[4]   Chemistry and kinetics of chemical vapour deposition of pyrocarbon .1. Fundamentals of kinetics and chemical reaction engineering [J].
Benzinger, W ;
Becker, A ;
Huttinger, KJ .
CARBON, 1996, 34 (08) :957-966
[5]  
BENZINGER W, 1997, UNPUB CARBON
[6]  
BENZINGER W, THESIS U KARLSRUHE G
[7]  
BENZINGER W, 1996, Patent No. 196460948
[8]   PYROLYTIC FILM RESISTORS - CARBON AND BOROCARBON [J].
GRISDALE, RO ;
PFISTER, AC ;
VANROOSBROECK, W .
BELL SYSTEM TECHNICAL JOURNAL, 1951, 30 (02) :271-314
[9]   Densification of carbon/carbon composites by pulse chemical vapor infiltration [J].
Jeong, HJ ;
Park, HD ;
Lee, JD ;
Park, JO .
CARBON, 1996, 34 (03) :417-421