Pressure and temperature dependence of the absorption edge of a thick Ga0.92In0.08As0.985N0.015 layer

被引:70
作者
Perlin, P [1 ]
Subramanya, SG
Mars, DE
Kruger, J
Shapiro, NA
Siegle, H
Weber, ER
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Hewlett Packard Labs, Palo Alto, CA 94304 USA
关键词
D O I
10.1063/1.122869
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied the pressure and temperature dependence of the absorption edge of a 4-mu m-thick layer of the alloy Ga0.92In0.08As0.985N0.015. We have measured the hydrostatic pressure coefficient of the energy gap of this alloy to be 51 meV/GPa, which is more than a factor two lower than that of GaAs (116 meV/GPa). This surprisingly large lowering of the pressure coefficient is attributed to the addition of only similar to 1.5% nitrogen. In addition, the temperature-induced shift of the edge is reduced by the presence of nitrogen. We can explain this reduction by the substantial decrease of the dilatation term in the temperature dependence of the energy gap. (C) 1998 American Institute of Physics. [S0003-6951(98)01251-0].
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页码:3703 / 3705
页数:3
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