Multiscale simulations of silicon nanoindentation

被引:97
作者
Smith, GS
Tadmor, EB
Bernstein, N
Kaxiras, E
机构
[1] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
[2] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
基金
美国国家科学基金会;
关键词
indentation; theory & modeling; semiconductors; mechanical properties (constitutive equations); electrical properties (electronic conductivity);
D O I
10.1016/S1359-6454(01)00267-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanoindentation experiments are an excellent probe of micromechanical properties, but their interpretation is complicated by the multiple length scales involved. We report simulations of silicon nanoindentation, based on an extended version of the local quasicontinuum model, capable of handling complex crystal structures, This method embeds an interatomic force law within a finite element framework. We identify which features of the simulation are robust by investigating the effect of different interatomic force laws and different finite element meshes. We find that our simulations qualitatively reproduce the experimental load vs. displacement curves of indented silicon and provide information on the microscopic aspects of the phase trans formations that take place during indentation. This information is linked to the macroscopic electrical resistance, providing a simple physical picture that gives a satisfactory explanation of experimental results. (C) 2001 Acta Materialia Ltd. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:4089 / 4101
页数:13
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