共 41 条
Mechanical and optical properties of hard SiCN coatings prepared by PECVD
被引:145
作者:

Jedrzejowski, P
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机构: Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada

Cizek, J
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机构: Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada

Amassian, A
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机构: Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada

Klemberg-Sapieha, JE
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机构: Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada

Vlcek, J
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机构: Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada

Martinu, L
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机构: Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada
机构:
[1] Ecole Polytech, CGM, Grp Rech Phys & Technol Couches Minces, Montreal, PQ H3C 3A7, Canada
[2] Ecole Polytech, Dept Engn Phys, Montreal, PQ H3C 3A7, Canada
[3] Univ W Bohemia, Dept Phys, Plzen 30614, Czech Republic
来源:
关键词:
PECVD;
SiCN;
mechanical properties;
spectroscopic ellipsometry;
microstructure;
D O I:
10.1016/S0040-6090(03)01057-5
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Novel amorphous SiCN coatings are becoming increasingly attractive because of their mechanical, optical and electronic properties. In the present work, SiCN films were fabricated by PECVD from SiH4/CH4/N-2/Ar gas mixtures at a temperature of 400 degreesC. Mechanical properties such as hardness, Young's modulus, friction coefficient and stress were evaluated, respectively, by depth-sensing indentation, pin-on-disk, micro-scratch and curvature methods. Films deposited under optimized conditions exhibited a hardness > 30 GPa, Young's modulus > 190 GPa, elastic rebound of 85% and a compressive stress of approximately I GPa. A friction coefficient against Al2O3, ranging from 0.75 to 0.25 and a low surface roughness of approximately 1 nm were found to be accompanied by a refractive index ranging from 1.85 to 2.10 (at 550 nm) and an extinction coefficient between 1.0 X 10(-4) and 4.5 X 10(-2). The film behavior is correlated with the microstructure and composition determined by SEM, XPS, AFM and broad-range UV-VIS-NIR-IR spectroscopic ellipsometry. (C) 2003 Elsevier B.V. All rights reserved.
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页码:201 / 207
页数:7
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共 41 条
[1]
Silicon carbonitride, a new hard material and its relation to the confusion about 'harder than diamond' C3N4
[J].
Badzian, A
;
Badzian, T
;
Roy, R
;
Drawl, W
.
THIN SOLID FILMS,
1999, 354 (1-2)
:148-153

Badzian, A
论文数: 0 引用数: 0
h-index: 0
机构:
Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA

Badzian, T
论文数: 0 引用数: 0
h-index: 0
机构:
Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA

Roy, R
论文数: 0 引用数: 0
h-index: 0
机构:
Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA

Drawl, W
论文数: 0 引用数: 0
h-index: 0
机构:
Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA Penn State Univ, Mat Res Lab 271, University Pk, PA 16802 USA
[2]
Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings
[J].
Bendeddouche, A
;
Berjoan, R
;
Bêche, E
;
Hillel, R
.
SURFACE & COATINGS TECHNOLOGY,
1999, 111 (2-3)
:184-190

Bendeddouche, A
论文数: 0 引用数: 0
h-index: 0
机构: CNRS, IMP, F-66120 Font Romeu, France

Berjoan, R
论文数: 0 引用数: 0
h-index: 0
机构: CNRS, IMP, F-66120 Font Romeu, France

Bêche, E
论文数: 0 引用数: 0
h-index: 0
机构: CNRS, IMP, F-66120 Font Romeu, France

Hillel, R
论文数: 0 引用数: 0
h-index: 0
机构: CNRS, IMP, F-66120 Font Romeu, France
[3]
Microstructure, mechanical properties, and wetting behavior of Si-C-N thin films grown by reactive magnetron sputtering
[J].
Berlind, T
;
Hellgren, N
;
Johansson, MP
;
Hultman, L
.
SURFACE & COATINGS TECHNOLOGY,
2001, 141 (2-3)
:145-155

Berlind, T
论文数: 0 引用数: 0
h-index: 0
机构:
Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden

Hellgren, N
论文数: 0 引用数: 0
h-index: 0
机构:
Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden

Johansson, MP
论文数: 0 引用数: 0
h-index: 0
机构:
Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden

Hultman, L
论文数: 0 引用数: 0
h-index: 0
机构:
Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden Linkoping Univ, Dept Phys & Measurement Technol, Thin Film Phys Div, S-58183 Linkoping, Sweden
[4]
Mechanical properties of nanometric structures of Si/SiC, C/SiC and C/SiN produced by PECVD
[J].
Bertran, E
;
Martínez, E
;
Viera, G
;
Farjas, J
;
Roura, P
.
DIAMOND AND RELATED MATERIALS,
2001, 10 (3-7)
:1115-1120

Bertran, E
论文数: 0 引用数: 0
h-index: 0
机构: Univ Barcelona, FEMAN, Dept Fis Aplicada & Opt, E-08028 Barcelona, Catalonia, Spain

Martínez, E
论文数: 0 引用数: 0
h-index: 0
机构: Univ Barcelona, FEMAN, Dept Fis Aplicada & Opt, E-08028 Barcelona, Catalonia, Spain

Viera, G
论文数: 0 引用数: 0
h-index: 0
机构: Univ Barcelona, FEMAN, Dept Fis Aplicada & Opt, E-08028 Barcelona, Catalonia, Spain

Farjas, J
论文数: 0 引用数: 0
h-index: 0
机构: Univ Barcelona, FEMAN, Dept Fis Aplicada & Opt, E-08028 Barcelona, Catalonia, Spain

论文数: 引用数:
h-index:
机构:
[5]
Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition
[J].
Chen, KH
;
Wu, JJ
;
Wen, CY
;
Chen, LC
;
Fan, CW
;
Kuo, PF
;
Chen, YF
;
Huang, YS
.
THIN SOLID FILMS,
1999, 355
:205-209

Chen, KH
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Wu, JJ
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Wen, CY
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Chen, LC
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Fan, CW
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Kuo, PF
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Chen, YF
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan

Huang, YS
论文数: 0 引用数: 0
h-index: 0
机构: Acad Sinica, Inst Atom & Mol Sci, Taipei, Taiwan
[6]
Formation of crystalline silicon carbon nitride films by microwave plasma-enhanced chemical vapor deposition
[J].
Chen, LC
;
Yang, CY
;
Bhusari, DM
;
Chen, KH
;
Lin, MC
;
Lin, JC
;
Chuang, TJ
.
DIAMOND AND RELATED MATERIALS,
1996, 5 (3-5)
:514-518

Chen, LC
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN

Yang, CY
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN

Bhusari, DM
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN

Chen, KH
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN

Lin, MC
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN

Lin, JC
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN

Chuang, TJ
论文数: 0 引用数: 0
h-index: 0
机构: ACAD SINICA, INST ATOM & MOLEC SCI, TAIPEI 10764, TAIWAN
[7]
Ellipsometric study of carbon nitride thin films with and without silicon addition
[J].
Chen, LC
;
Lin, HY
;
Wong, CS
;
Chen, KH
;
Lin, ST
;
Yu, YC
;
Wang, CW
;
Lin, EK
;
Ling, KC
.
DIAMOND AND RELATED MATERIALS,
1999, 8 (2-5)
:618-622

Chen, LC
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Lin, HY
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Wong, CS
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Chen, KH
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Lin, ST
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Yu, YC
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Wang, CW
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Lin, EK
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan

Ling, KC
论文数: 0 引用数: 0
h-index: 0
机构: Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10764, Taiwan
[8]
HARDNESS AND YOUNGS MODULUS OF AMORPHOUS A-SIC THIN-FILMS DETERMINED BY NANOINDENTATION AND BULGE TESTS
[J].
ELKHAKANI, MA
;
CHAKER, M
;
JEAN, A
;
BOILY, S
;
KIEFFER, JC
;
OHERN, ME
;
RAVET, MF
;
ROUSSEAUX, F
.
JOURNAL OF MATERIALS RESEARCH,
1994, 9 (01)
:96-103

ELKHAKANI, MA
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

CHAKER, M
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

JEAN, A
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

BOILY, S
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

KIEFFER, JC
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

OHERN, ME
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

RAVET, MF
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914

ROUSSEAUX, F
论文数: 0 引用数: 0
h-index: 0
机构: NANO INSTRUMENTS INC,KNOXVILLE,TN 37914
[9]
Effects of nitrogen fraction on the structure of amorphous silicon-carbon-nitrogen alloys
[J].
Gao, Y
;
Wei, J
;
Zhang, DH
;
Mo, ZQ
;
Hing, P
;
Shi, X
.
THIN SOLID FILMS,
2000, 377
:562-566

Gao, Y
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

Wei, J
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

Zhang, DH
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

Mo, ZQ
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

Hing, P
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

Shi, X
论文数: 0 引用数: 0
h-index: 0
机构: Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[10]
SiGN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition
[J].
Gomez, FJ
;
Prieto, P
;
Elizalde, E
;
Piqueras, J
.
APPLIED PHYSICS LETTERS,
1996, 69 (06)
:773-775

Gomez, FJ
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN

Prieto, P
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN

Elizalde, E
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN

Piqueras, J
论文数: 0 引用数: 0
h-index: 0
机构:
UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN UNIV AUTONOMA MADRID,DEPT FIS APLICADA,MADRID 28049,SPAIN