Thickness dependence of magnetic and transport properties of chromium dioxide (CrO2) strained epitaxial thin films

被引:7
作者
Anguelouch, A [1 ]
Gupta, A
Xiao, G
机构
[1] Brown Univ, Dept Phys, Providence, RI 02912 USA
[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Heights, NY 10598 USA
基金
美国国家科学基金会;
关键词
D O I
10.1109/20.951100
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Chromium dioxide (CrO2) thin films of different thicknesses (120-2600 Angstrom) have been grown epitaxially on (100)-oriented TiO2 substrates by the chemical vapor deposition technique. The thicker films, with a Curie temperature of 395 K, exhibit in-plane magnetocrystalline anisotropy with the magnetic easy axis along the c-axis. direction. At low temperatures, the easy axis is deflected from the c- toward the b-axis in the thickness range 1500-600 Angstrom. For even smaller thicknesses, the c-axis and the magnetic easy axis coincide again. However, at 300 K, the c-axis is always the magnetic easy axis in every film studied. Resistivity measurement in the temperature range of 4.2 to 420 K has also been performed. Temperature dependence of the resistivity is highly anisotropic between the b- and the c-axis, due to thickness induced anisotropic strain in the CrO2 films.
引用
收藏
页码:2135 / 2137
页数:3
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