Dynamic self-organization of strained islands during SiGe epitaxial growth

被引:48
作者
Floro, JA
Chason, E
Sinclair, MB
Freund, LB
Lucadamo, GA
机构
[1] Sandia Natl Labs, Albuquerque, NM 87185 USA
[2] Brown Univ, Div Engn, Providence, RI 02912 USA
[3] Lehigh Univ, Dept Mat Sci & Engn, Bethlehem, PA 18015 USA
关键词
D O I
10.1063/1.122049
中图分类号
O59 [应用物理学];
学科分类号
摘要
Dynamic self-organization of coherently strained islands during SiGe molecular beam epitaxy on Si(001) is measured in real time using a novel spectroscopic light scattering technique. We show that an array of hut clusters self-orders on a square mesh with increasing areal coverage. Ordering occurs to minimize the repulsive elastic interactions between neighboring islands. Self-organization breaks down when islands coalesce during deposition or during static coarsening. (C) 1998 American Institute of Physics.
引用
收藏
页码:951 / 953
页数:3
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