Energy levels of isolated interstitial hydrogen in silicon

被引:177
作者
Herring, C
Johnson, NM
Van de Walle, CG
机构
[1] Xerox Corp, Palo Alto Res Ctr, Palo Alto, CA 94304 USA
[2] Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
关键词
D O I
10.1103/PhysRevB.64.125209
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper first describes the quantitative determination of the static and dynamic properties of the locally stable states of monatomic hydrogen dissolved in crystalline silicon: H+, H-0, and H-. The monatomic hydrogens were created controllably near room temperature by using hole-stimulated dissociation of phosphorus-hydrogen (PH) complexes. Drift velocities and charge-change rates were studied via time-resolved capacitance-transient measurements in Schottky diodes under changes of bias. These data enable the donor level epsilon (D) of H-2 to be located at similar to0.16 eV below the conduction band (confirming that the E3' center found in proton-implanted Si corresponds to interstitial H in undamaged Si), and the acceptor level epsilon (A) at similar to0.07 eV below midgap, so that hydrogen is a "negative-U" system. The experimental values of en and sn are consistent with predictions from first-principles calculations, which also provide detailed potential-energy surfaces for hydrogen in each charge state. While the phonon-mediated reaction H- H-0-->H+ + e(-) is fast, the reaction H- --> H-0 + e(-) has an activation energy similar to0.84 eV, well above the energy difference (similar to0.47 eV) between initial and final states. Our experiments also yielded diffusion coefficients near room temperature for H-1(+), H-2(+), and H-2(-). The asymmetrical positioning of epsilon (D) and epsilon (A) in the gap accounts for many previously unexplained effects. For example. it is shown to be responsible for the much greater difficulty of passivating phosphorus-doped than comparably boron-doped Si. And while modest hole concentrations dissociate PH complexes rapidly at temperatures where thermal dissociation takes years, we could not detect an analogous dissociation of BH complexes by minority electrons. a process that is expected to be frustrated by the rapid thermal ionization of H-0. The distribution of hydrogen in n-on-n epitaxial layers hydrogenated at 300 degreesC can be accounted for if the donor-hydrogen complexes are in thermal equilibrium with H-2 complexes whose binding energy (relative to H+ + H-) is of the order of 1.75 eV. With this binding energy, the measured migration of H-2 at 200 degreesC and below must be by diffusion without dissociation.
引用
收藏
页数:27
相关论文
共 73 条
[31]   MIGRATION OF THE H-2STAR COMPLEX AND ITS RELATION TO H- IN N-TYPE SILICON [J].
JOHNSON, NM ;
HERRING, C .
PHYSICAL REVIEW B, 1991, 43 (17) :14297-14300
[32]  
JOHNSON NM, 1988, MATERIALS RES SOC S, V104, P277
[33]  
JOHNSON NM, 1991, SEMICONDUCT SEMIMET, V34, pCH7
[34]  
JOHNSON NR, UNPUB
[35]   SI-29 HYPERFINE-STRUCTURE OF ANOMALOUS MUONIUM IN SILICON - PROOF OF THE BOND-CENTERED MODEL [J].
KIEFL, RF ;
CELIO, M ;
ESTLE, TL ;
KREITZMAN, SR ;
LUKE, GM ;
RISEMAN, TM ;
ANSALDO, EJ .
PHYSICAL REVIEW LETTERS, 1988, 60 (03) :224-226
[36]  
Kimerling L. C., 1979, International Conference on Defects and Radiation Effects in Semiconductors, P273
[37]   FAST CAPACITANCE TRANSIENT APPARATUS - APPLICATION TO ZNO AND O CENTERS IN GAP PARANORMAL JUNCTIONS [J].
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3014-3022
[38]   DOUBLE CORRELATION TECHNIQUE (DDLTS) FOR ANALYSIS OF DEEP LEVEL PROFILES IN SEMICONDUCTORS [J].
LEFEVRE, H ;
SCHULZ, M .
APPLIED PHYSICS, 1977, 12 (01) :45-53
[39]   Raman spectroscopy of hydrogen molecules in crystalline silicon [J].
Leitch, AWR ;
Alex, V ;
Weber, J .
PHYSICAL REVIEW LETTERS, 1998, 81 (02) :421-424
[40]   Calculations of silicon self-interstitial defects [J].
Leung, WK ;
Needs, RJ ;
Rajagopal, G ;
Itoh, S ;
Ihara, S .
PHYSICAL REVIEW LETTERS, 1999, 83 (12) :2351-2354