共 11 条
[1]
BOKOR J, 1998, IN PRESS J VAC B NOV
[2]
GWYN CW, 1998, IN PRESS J VAC SCI B
[4]
KUBIAK GD, 1996, OSA TRENDS OPTICS PH, V4, P66
[5]
Minimum critical defects in extreme-ultraviolet lithography masks
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1997, 15 (06)
:2467-2470
[6]
Control of defects in EUV-multilayers and demonstration of at-wavelength defect characterization by EUV-microscopy.
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES II,
1998, 3331
:400-405
[7]
NGUYEN K, 1996, OSA TOPS EXTREME ULT, V4, P49
[8]
MASK TECHNOLOGIES FOR SOFT-X-RAY PROJECTION LITHOGRAPHY AT 13 NM
[J].
APPLIED OPTICS,
1993, 32 (34)
:7007-7011
[9]
UNDERWOOD JR, COMMUNICATION
[10]
VERNON SP, 1996, OSA TOPS EXTREME ULT, V4, P44