Recent developments in Magnetic Tunnel Junction MRAM

被引:251
作者
Tehrani, S [1 ]
Engel, B
Slaughter, JM
Chen, E
DeHerrera, M
Durlam, M
Naji, P
Whig, R
Janesky, J
Calder, J
机构
[1] Motorola Inc, Tempe, AZ 85284 USA
[2] Motorola Labs, Phys Sci Res Labs, Tempe, AZ 85284 USA
关键词
magnetic tunnel junction (MTJ); magnetoresistive random access memory (MRAM); micromagnetic switching; MRAM integration;
D O I
10.1109/20.908581
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We summarize our progress on Magnetoresistive Random Access Memory (MRAM) based on Magnetic Tunnel Junctions (MTJ), We have demonstrated MTJ material in the 1-1000 k Omega-mum(2) range with MR values above 40%, The switching characteristics are mainly governed by the magnetic shape anisotropy that arises from the element boundaries. The switching repeatability, as well as hard axis selectability, are shown to be dependent on both shape and aspect ratio. MTJ memory elements were successfully integrated with 0.6 mum CMOS technology, achieving read and program address access times of 14 ns in a 256 x 2 MRAM.
引用
收藏
页码:2752 / 2757
页数:6
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