Quantitative assessment of the photosaturation technique

被引:39
作者
Aphek, OB [1 ]
Kronik, L [1 ]
Leibovitch, M [1 ]
Shapira, Y [1 ]
机构
[1] Tel Aviv Univ, Fac Engn, Dept Phys Elect, IL-69978 Tel Aviv, Israel
关键词
photosaturation; surface band-bending; surface photovoltage;
D O I
10.1016/S0039-6028(98)00277-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The photosaturation technique is a well-known method for measuring the band-bending at semiconductor surfaces. It is based on the assumption that the bands can be flattened upon suffciently intense illumination. The validity of this approach has been a subject of considerable dispute. A rigorous, quantitative examination of the method is presented. The physical mechanisms governing the photosaturation experiment are identified and analyzed using both an analytical and a numerical model. We show that while the technique is essentially valid, the illumination intensity required to obtain band flattening may be unrealistically high. Criteria for attaining photosaturation are formulated in terms of surface state parameters. Numerous pitfalls and sources of misinterpretation are pointed out. Specifically, a previously undiscussed pseudo-saturation due to surface states with significantly different thermal cross-sections, is described. A systematic approach to future experiments is suggested. (C) 1998 Elsevier Science B.V. All rights reserved.
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页码:485 / 500
页数:16
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