Preparation of self-organized mesoscale polymer patterns on a solid substrate: Continuous pattern formation from a receding meniscus

被引:185
作者
Yabu, H
Shimomura, M
机构
[1] Hokkaido Univ, Res Inst Elect Sci, Nanotechnol Res Ctr, Sapporo, Hokkaido 0600812, Japan
[2] Riken Inst Phys & Chem Res, Inst Phys & Chem Res, Frontier Res Syst, Wako, Saitama 3510198, Japan
[3] CREST, JST, Kawaguchi, Saitama 3320012, Japan
关键词
D O I
10.1002/adfm.200400315
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Regular polymer patterns are formed from casting a dilute polymer solution on a solid substrate. Dissipative structures, e.g., convection patterns, fingering instabilities, and so on, are formed in the evaporation process of casting polymer films. Controlled production and manufacturing of patterned polymer films can be achieved when the evaporating solution edge, especially the meniscus region on the casting substrate, is formed under controlled casting conditions. In this report, we describe a computer-controlled apparatus which has two precisely manipulated sliding glass plates. A narrow, thin liquid film of polymer solution with a receding meniscus is continuously supplied from a small gap between two glass plates (one sliding and the other stationary), and a patterned polymer film is subsequently formed on the stationary substrate from the evaporating solution edge. Several types of polymer patterns from various polymers are reproducibly prepared by changing preparation conditions such as sliding speed and polymer concentration.
引用
收藏
页码:575 / 581
页数:7
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