Matrix-assisted laser deposition of a sorbent oligomer using an infrared laser

被引：39

作者：

Bubb, DM ^{[1
]}

O'Malley, SM

Antonacci, C

Simonson, D

McGill, RA

机构：

[1] Seton Hall Univ, Dept Phys, S Orange, NJ 07079 USA

[2] Seton Hall Univ, Dept Chem & Biochem, S Orange, NJ 07079 USA

[3] USN, Res Lab, Funct Mat Sect, Washington, DC 20375 USA

[4] Nova Res, Alexandria, VA USA

来源：

JOURNAL OF APPLIED PHYSICS | 2004年 / 95卷 / 04期

关键词：

D O I：

10.1063/1.1636522

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Fluoropolyol, a sorbent chemoselective oligomer, has been deposited using a matrix-assisted laser-based deposition technique. A comparison of films deposited with infrared (2.94 mum) and ultraviolet (UV) (193 nm) radiation shows that photochemical and/or photothermal modification of the oligomer occurs for the UV-deposited films while the IR-deposited films appear to be identical to the starting material. In addition, it is shown that even ablating the matrix alone causes a film to be deposited when using a UV laser. Therefore, unless photochemical interactions are a desired outcome, the use of a UV laser for most matrix-assisted laser ablation and deposition techniques is unfavorable. (C) 2004 American Institute of Physics.

引用

页码：2175 / 2177

页数：3

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