Sputtering and smoothing of metal surface with energetic gas cluster beams

被引：39

作者：

Insepov, Z ^{[1
]}

Yamada, I

Sosnowski, M

机构：

[1] Kyoto Univ, Ion Beam Engn Expt Lab, Sakyo Ku, Kyoto 60601, Japan

[2] New Jersey Inst Technol, Newark, NJ 07102 USA

来源：

MATERIALS CHEMISTRY AND PHYSICS | 1998年 / 54卷 / 1-3期

关键词：

cluster ions; impact; molecular dynamics; surface morphology;

D O I：

10.1016/S0254-0584(98)00032-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sputtering is a process of surface erosion by energetic ions. One of the remarkable effects of sputtering with cluster ions is surface smoothing. To understand its mechanism we have developed a computational model, which utilizes molecular dynamics (MD) to simulate rapid atomic collisions in the central impact zone, and a finite-difference method to account for processes occurring on a longer time scale over a wider target area. A case of gas cluster of a few hundred Ar atoms impacting a Cu target with energy up to 20 keV has been considered. The MD simulation has revealed that the atoms ejected from the surface have a significant lateral momentum component (parallel to the surface) which may have a major effect on surface morphology. Evolution of surface morphology under cluster ion irradiation was described by the modified Kuramoto-Sivashinsky equation. Comparison of the simulations with experimental data shows qualitative agreement. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：234 / 237

页数：4

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