XPS, Raman spectroscopy, X-ray diffraction, specular X-ray reflectivity, transmission electron microscopy and elastic recoil detection analysis of emissive carbon film characterization

被引:63
作者
Ermolieff, A [1 ]
Chabli, A [1 ]
Pierre, F [1 ]
Rolland, G [1 ]
Rouchon, D [1 ]
Vannuffel, C [1 ]
Vergnaud, C [1 ]
Baylet, J [1 ]
Séméria, MN [1 ]
机构
[1] LETI, CEA Technol Avancees, F-38054 Grenoble 9, France
关键词
emissive carbon films; XPS; Raman spectroscopy; X-ray; TEM; ERDA;
D O I
10.1002/sia.955
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
For a better understanding of the physical and electronic properties of emissive carbon films, one of the best ways is to compare the results obtained with several surface and structural analysis techniques. In this article, different types of carbon film depositions for developing large flat panel displays by field emission displays are analysed and the results are correlated with their emissivity. Pulse laser ablation films, high-temperature plasma-enhanced chemical vapour deposition (PECVD) films and low-temperature PECVD films are characterized by XPS, Raman spectroscopy, X-ray diffraction (XRD), specular X-ray reflectivity, transmission electron microscopy (TEM) and elastic recoil detection analysis (ERDA). The analyses lead us to conclude that the sp(2)/sp(3) ratio is not a crucial parameter for carbon film emissivity. Crystalline structure seems more important. The presence of graphite grains is essential for good and uniform emission. Combination of XPS, TEM, XRD, Raman spectroscopy and ERDA is necessary for the study of carbon film emission. Copyright (C) 2001 John Wiley & Sons, Ltd.
引用
收藏
页码:185 / 190
页数:6
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