Site and morphology controlled ZnO deposition on pd catalyst prepared from Pd/PMMA thin film using UV lithography

被引:43
作者
Lee, JY [1 ]
Yin, DH [1 ]
Horiuchi, S [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Nanotechnol Res Inst, Tsukuba, Ibaraki 3058565, Japan
关键词
D O I
10.1021/cm0506555
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Well-defined line patterns of zinc oxide (ZnO) were site-selectively grown on the photopatterned palladium (Pd) catalysts through an electroless deposition process under mild conditions. Pd catalysts in the form of nanoparticles were mainly positioned on the UV irradiated surface of polymethyl methacrylate (PMMA) film via the reduction of vaporized palladium(II) bis(acetylacetonato) denoted as Pd(acac)2 in our drying process. The catalytic activity of the Pd nanoparticles was affected by the PMMA film thickness, the UV dose, and the exposure time to Pd(acac)2, whose optimum values were ca. 20 nm, 20 J/cm(2), and 5 min, respectively. The ZnO pattern accuracy and the crystalline morphology were varied sensitively depending on the Pd particle size and deposition temperature, in which the former caused the fatter crystals, while the latter suppressed the lateral growth, giving the longer hexagonal nanorods.
引用
收藏
页码:5498 / 5503
页数:6
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