Grazing incidence x-ray absorption spectra of (Si/W)100/Si multilayer

被引:13
作者
Hayashi, K
Amano, H
Yamamoto, T
Kawai, J
Kitajima, Y
Takenaka, H
机构
[1] Kyoto Univ, Dept Mat Sci & Engn, Sakyo Ku, Kyoto 6068501, Japan
[2] High Energy Accelerator Res Org, Inst Mat Struct Sci, Photon Factory, Tsukuba, Ibaraki 3050801, Japan
[3] NTT Adv Technol Corp, Musashino, Tokyo 1808639, Japan
关键词
x-ray absorption spectra; multilayer; total reflection;
D O I
10.1016/S0584-8547(98)00210-9
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Tungsten (W) M-III x-ray absorption spectra of a periodic multilayer, (Si/W)(100)/Si, were measured with the change of x-ray grazing angle using sample current method. Under not total reflection condition, the absorbance changed little except at W M-III absorption edge. While under the total reflection condition, the absorbance increased with the increase of the X-ray energy and the increment changed from low to high at the W M-III absorption edge. This result reflected the variation of the X-ray evanescent wavelength caused by the absorption effect of W. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:223 / 226
页数:4
相关论文
共 10 条
[1]   Photoelectron spectra enhanced by x-ray total reflection and diffraction from periodic multilayer [J].
Hayashi, K ;
Kawato, S ;
Horiuchi, T ;
Matsushige, K ;
Kitajima, Y ;
Takenaka, H ;
Kawai, J .
APPLIED PHYSICS LETTERS, 1996, 68 (14) :1921-1923
[2]   X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].
HENKE, BL ;
GULLIKSON, EM ;
DAVIS, JC .
ATOMIC DATA AND NUCLEAR DATA TABLES, 1993, 54 (02) :181-342
[3]   SURFACE SENSITIVE X-RAY-ABSORPTION FINE-STRUCTURE MEASUREMENT USING SAMPLE CURRENT-INDUCED BY TOTALLY REFLECTED X-RAYS [J].
KAWAI, J ;
HAYAKAWA, S ;
KITAJIMA, Y ;
SUZUKI, S ;
MAEDA, K ;
URAI, T ;
ADACHI, H ;
TAKAMI, M ;
GOHSHI, Y .
PROCEEDINGS OF THE JAPAN ACADEMY SERIES B-PHYSICAL AND BIOLOGICAL SCIENCES, 1993, 69 (07) :179-184
[4]   Total reflection x-ray excited photoelectron spectra of copper phthalocyanine thin layer on Si wafer [J].
Kawai, J ;
Kawato, S ;
Hayashi, K ;
Horiuchi, T ;
Matsushige, K ;
Kitajima, Y .
APPLIED PHYSICS LETTERS, 1995, 67 (26) :3889-3891
[5]   A NUMERICAL-SIMULATION OF TOTAL REFLECTION X-RAY PHOTOELECTRON-SPECTROSCOPY (TRXPS) [J].
KAWAI, J ;
TAKAMI, M ;
FUJINAMI, M ;
HASHIGUCHI, Y ;
HAYAKAWA, S ;
GOHSHI, Y .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1992, 47 (08) :983-991
[6]   Total reflection x-ray photoelectron spectroscopy [J].
Kawai, J ;
Hayakawa, S ;
Kitajima, Y ;
Maeda, K ;
Gohshi, Y .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1995, 76 :313-318
[7]   SAMPLE CURRENT MAXIMUM AT THE CRITICAL ANGLE OF X-RAY TOTAL-REFLECTION [J].
KAWAI, J ;
HAYAKAWA, S ;
SUZUKI, S ;
KITAJIMA, Y ;
TAKATA, Y ;
URAI, T ;
MEAEDA, K ;
FUJINAMI, M ;
HASHIGUCHI, Y ;
GOHSHI, Y .
APPLIED PHYSICS LETTERS, 1993, 63 (02) :269-271
[8]  
KAWAI J, 1995, ADV XRAY CHEM ANAL S, V26, P98
[9]  
TAKATA Y, 1992, J SCI HIROSHIMA U A, V56, P1
[10]  
TAKENAKA H, 1995, P EXTR ULTR LITH, V23, P26